Hui Zhao, Jingfeng Wang, Mukun He, Shuai Li, Hua Guo, Dongxiao Kan, Hua Qiu, Lixin Chen* and Junwei Gu*. Electromagnetic Interference Shielding Films: Structure Design and Prospects. Small Methods, 2024, DOI: 10.1002/smtd.202401324. 2023IF=10.7.
https://onlinelibrary.wiley.com/doi/10.1002/smtd.202401324
Abstract
The popularity of portable and wearable flexible electronic devices, coupled with the rapid advancements in military field, requires electromagnetic interference (EMI) shielding materials with lightweight, thin, and flexible characteristics, which are incomparable for traditional EMI shielding materials. The film materials can fulfill the above requirements, making them among the most promising EMI shielding materials for next-generation electronic devices. Meticulously controlling structure of composite film materials while optimizing the electromagnetic parameters of the constructed components can effectively dissipate and transform electromagnetic wave energy. Herein, the review systematically outlines high-performance EMI shielding composite films through structural design strategies, including homogeneous structure, layered structure, and porous structure. The attenuation mechanism of EMI shielding materials and the evaluation (Schelkunoff theory and calculation theory) of EMI shielding performance are introduced in detail. Moreover, the effect of structure attributes and electromagnetic properties of composite films on the EMI shielding performance is analyzed, while summarizing design criteria and elucidating the relevant EMI shielding mechanism. Finally, the future challenges and potential application prospects of EMI shielding composite films are prospected. This review provides crucial guidance for the construction of advanced EMI shielding films tailored for highly customized and personalized electronic devices in the future.
便攜式、可穿戴柔性電子設(shè)備的普及以及軍事領(lǐng)域的快速發(fā)展，對電磁屏蔽材料提出了輕質(zhì)、薄型、柔性等特性要求，這是傳統(tǒng)電磁屏蔽材料無法比擬的。而薄膜材料能夠兼顧上述要求，已經(jīng)成為下一代電子設(shè)備最有前途的電磁屏蔽材料之一。在精細(xì)調(diào)控薄膜材料結(jié)構(gòu)的同時(shí)，優(yōu)化組構(gòu)的電磁參數(shù)，可有效地耗散和轉(zhuǎn)化電磁波能量。因此，從結(jié)構(gòu)設(shè)計(jì)出發(fā)，本綜述系統(tǒng)地概述了高性能電磁屏蔽復(fù)合薄膜的研究進(jìn)展，包括均勻結(jié)構(gòu)、層狀結(jié)構(gòu)、多孔結(jié)構(gòu)等。詳細(xì)介紹了電磁屏蔽材料的衰減機(jī)理和電磁屏蔽性能的評價(jià)方法（Schelkunoff理論和計(jì)算理論），重點(diǎn)分析了復(fù)合薄膜的結(jié)構(gòu)特性和電磁參數(shù)對電磁屏蔽性能的影響規(guī)律，同時(shí)，總結(jié)了電磁屏蔽復(fù)合薄膜的設(shè)計(jì)準(zhǔn)則，并闡明了相關(guān)的電磁屏蔽機(jī)理。最后，展望了電磁屏蔽復(fù)合薄膜面臨的挑戰(zhàn)和潛在的應(yīng)用前景，為未來高度定制化、個(gè)性化電子設(shè)備所需的先進(jìn)電磁屏蔽薄膜的構(gòu)建提供了重要的指導(dǎo)。
第一作者：趙輝
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