[Langmuir] Controlled evaporative self-assembly of polyacrylic acid in a confined geometry for fabricating pattern ed polymer brushes
作者：Yonghong Men, Peng Xiao and Tao Chen* et al.
關鍵字：CESA, Polymer Brushes
論文來源：期刊
具體來源：Langmuir 2014, 30，4863-4867
發表時間：2014年
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photo polymerization (SIPGP). Our method was carried out without any sophisticated instruments with lithograpy free, overcoming current difficulties in fabricating polymer patterns by using complex instruments.